| 摘要 |
PURPOSE: A manufacturing method of a photosensitive resin composition is provided to have excellent patterning, thermal resistance and chemical resistance and to be excellent hole and patterning property when forming a color filter on a TFT array substrate. CONSTITUTION: A manufacturing method of an acryl copolymer which comprises organic phosphorus indicated in chemical formula 1 comprises a step of reaction of an aryl phosphoryl halide or dialkyl and an acryl copolymer which comprises a hydroxy alkyl group. In chemical formula 1, R1 is a hydrogen or C1-20 alkyl, aryl, alkylaryl, cycloalkyl, or multicycloalkyl; and R2 is a C1-6 alkyl group; R3 is a C1-20 alkyl, aryl, alkylaryl, cycloalkyl, or multicycloalkyl. A photosensitive resin composition comprises a copolymer resin with a repeating unit indicated in chemical formula 2, photopolymerizable, acrylic monomer, photopolymerization initiator, pigment, and solvent.
|
