| 摘要 |
<p>Provided is a compound for forming a self-assembled mono-molecular film which forms an organic semiconductor layer and which imparts a substrate surface with good wettability with respect to a solvent, the compound having a structure represented by chemical formula (1). In chemical formula (1), n is 1 or 8, R1 is CH3 or C2H5, and R2 and R3 are represented by any of (A) to (C). (A): A combination whereby R2 is H and R3 is CH3, C2H5, C6H13 or an aryl group. (B): R2 and R3 are the same, and are C2H5, C6H13 or an aryl group. (C): A combination whereby R2 is CH3, C2H5, C6H13 or an aryl group and R3 is CH3, C2H5, C6H13 or an aryl group (however, R2 ? R3). It is possible to form a self-assembled mono-molecular film, which undergoes little change over time in terms of contact angle in atmospheric air, on a surface of a substrate and form an organic semiconductor layer having good characteristics with good reproducibility.</p> |
