| 摘要 |
PURPOSE: An etching solution composition for hook analysis is provided to clearly and optically observe and analyze a hook in a metal. CONSTITUTION: A method for analyzing a hook in a metal comprises: a step of mixing picric acid, copper(II) chloride, and surfactant in distilled water(S10); a step of heating the mixture liquid to prepare an etching solution; and a step of dipping unnecessary piece into the etching solution(S20). The method further comprises a washing and drying the piece(S40). The surfactant includes dodecyl benzyl sulfonic acid or sodium dodecyl benzensulfonate. |
