| 摘要 |
A wiping device includes an intaglio cylinder, a cylinder cleaning device, and a wiping liquid supply device. The intaglio cylinder is rotatably supported. The cylinder cleaning device removes excess ink adhered to an outer surface of the intaglio cylinder. The wiping liquid supply device supplies a wiping liquid for cleaning to the cylinder cleaning device. The wiping liquid supply device includes a waste liquid tank, a new liquid tank, a first pump, and second pump. The waste liquid tank stores a waste wiping liquid discharged from the cylinder cleaning device. The new liquid tank stores a clean wiping liquid. The first pump supplies the clean wiping liquid from the new liquid tank to the cylinder cleaning device. The second pump supplies a supernatant liquid of the waste wiping liquid stored in the waste liquid tank and separated into a precipitate and the supernatant liquid to the cylinder cleaning device.
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