CMP SLURRY COMPOSITION FOR TUNGSTEN POLISHING

摘要

The present invention relates to a CMP slurry composition for tungsten polishing containing abrasives and polishing accelerators, wherein the abrasive comprises colloidal silica dispersed in ultrapure water and the polishing accelerator comprises aqueous hydrogen peroxide, ammonium persulfate, and ferric nitrate. The slurry composition does not cause a slurry discoloration problem and can be applied to a CMP process due to having excellent etch selectivity.