发明名称 |
SIZE-FILTERED MULTIMETAL STRUCTURES |
摘要 |
A size-filtered metal interconnect structure allows formation of metal structures having different compositions. Trenches having different widths are formed in a dielectric material layer. A blocking material layer is conformally deposited to completely fill trenches having a width less than a threshold width. An isotropic etch is performed to remove the blocking material layer in wide trenches, i.e., trenches having a width greater than the threshold width, while narrow trenches, i.e., trenches having a width less than the threshold width, remain plugged with remaining portions of the blocking material layer. The wide trenches are filled and planarized with a first metal to form first metal structures having a width greater than the critical width. The remaining portions of the blocking material layer are removed to form cavities, which are filled with a second metal to form second metal structures having a width less than the critical width.
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申请公布号 |
US2013043556(A1) |
申请公布日期 |
2013.02.21 |
申请号 |
US201113211351 |
申请日期 |
2011.08.17 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;HORAK DAVID V.;KOBURGER, III CHARLES W.;PONOTH SHOM;YANG CHIH-CHAO |
发明人 |
HORAK DAVID V.;KOBURGER, III CHARLES W.;PONOTH SHOM;YANG CHIH-CHAO |
分类号 |
H01L23/525;H01L21/20;H01L21/28;H01L23/48 |
主分类号 |
H01L23/525 |
代理机构 |
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代理人 |
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