| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin film manufacturing method and a thin film manufacturing apparatus capable of forming a thin film with uniform film composition in the substrate surface. <P>SOLUTION: In the thin film manufacturing method, a film is deposited while maintaining the temperature on the periphery of a substrate (second temperature) higher than the temperature in the center of the substrate (first temperature). When such a temperature distribution is formed, steam pressure on the periphery of the substrate is higher than that in the center of the substrate, and thereby the amount of high steam pressure component that can be contained in the gas phase on the periphery of the substrate can be increased. Consequently, precipitation of gaseous species distributed with high concentration above the periphery of the substrate can be suppressed, and a thin film can be formed with uniform composition in the substrate surface. <P>COPYRIGHT: (C)2013,JPO&INPIT |
