发明名称 |
RAPID THERMAL PROCESSING CHAMBER WITH MICRO-POSITIONING SYSTEM |
摘要 |
Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.
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申请公布号 |
US2013043235(A1) |
申请公布日期 |
2013.02.21 |
申请号 |
US201213656158 |
申请日期 |
2012.10.19 |
申请人 |
SORABJI KHURSHED;RANISH JOSEPH M.;ADERHOLD WOLFGANG;HUNTER AARON M.;KOELMEL BLAKE R.;LERNER ALEXANDER N.;MERRY NIR |
发明人 |
SORABJI KHURSHED;RANISH JOSEPH M.;ADERHOLD WOLFGANG;HUNTER AARON M.;KOELMEL BLAKE R.;LERNER ALEXANDER N.;MERRY NIR |
分类号 |
F27D11/00 |
主分类号 |
F27D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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