| 摘要 |
<p>An array substrate, a preparation method thereof and a display device. The method includes: exposing a substrate deposited with a transparent electrode layer and photoresist using a mask plate, photoresist remaining at the pixel position of a transparent electrode to form a photoresist pattern; etching the substrate forming the photoresist pattern; and depositing a transparent electrode layer on the etched substrate, then peeling off the photoresist. During the preparation of an array substrate, the patterns of the pixel electrode and common electrode of the display area of the array substrate are formed during one photoetching, which avoids the problem of uneven (Mura) display pictures caused by displacement of the pixel electrode and common electrode and ensures the uniformity of the display picture of the array substrate with a wide view angle mode, especially the uniformity of the display picture of a large scale panel.</p> |
