FILM FORMATION DEVICE AND FILM FORMATION METHOD

摘要

[Problem] To increase the service life of a quartz resonator used to measure film thickness in a film formation process, and to provide a film formation device and film formation method whereby film thickness can be controlled on the basis of the relationship between the amount of film formation for mixed gas and the amount of film formation for individual material gases when films are formed using a plurality of types of material gases. [Solution] Provided is a film formation device for forming a thin film on a substrate, the film formation device characterized in comprising: a material supply part for supplying a carrier gas and a material gas, the material supply part being capable of decompression; and a head for ejecting the material gas onto the top surface of the substrate; the material supply part and the head being communicated through a material gas supply channel; a branched flow channel for branching from the material gas supply channel being provided to the material gas supply channel; and a measurement device for measuring the amount of film formation of the material gas being connected to the branched flow channel.