Self-Calibrated Alignment and Overlay Target and Measurement

摘要

An alignment feature disposed on a substrate, the alignment feature including a first lithographic pattern having a first aggregate geometric center point defined by a first sub-pattern comprising alignment marks having a first sub-pattern geometric center point arranged a distance (d0) in a first direction from the first aggregate geometric center point, and a second sub-pattern comprising alignment marks having a second sub-pattern geometric center point arranged the distance d0 in a reciprocal direction of the first direction from the first aggregate geometric center point.