发明名称 |
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM |
摘要 |
A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.
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申请公布号 |
US2013045365(A1) |
申请公布日期 |
2013.02.21 |
申请号 |
US201213656960 |
申请日期 |
2012.10.22 |
申请人 |
FUJIFILM CORPORATION;FUJIFILM CORPORATION |
发明人 |
KATO KEITA;TARUTANI SHINJI;KAMIMURA SOU;ENOMOTO YUICHIRO;IWATO KAORU |
分类号 |
G03F7/20;B32B3/30;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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