发明名称 TECHNIQUES FOR DIAMOND NUCLEATION CONTROL FOR THIN FILM PROCESSING
摘要 Techniques for diamond nucleation control for thin film processing are disclosed. In one particular embodiment, the techniques may be realized as a method for generating a plasma having a plurality of ions; depositing a plurality of diamond nucleation centers on a substrate with the ions in the plasma using an extraction plate having at least one gap, wherein the plasma ions pass through the at least one gap in the extraction plate to generate a focused ion beam to deposit the plurality of diamond nucleation centers; and controlling the growth of a continuous diamond film from the diamond nucleation centers on the substrate by controlling at least one of a temperature around the substrate, a temperature of the plasma, a pressure around the substrate, and a concentration of the ions in the plasma.
申请公布号 US2013045339(A1) 申请公布日期 2013.02.21
申请号 US201113210122 申请日期 2011.08.15
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;GODET LUDOVIC;LU XIANFENG;RENAU ANTHONY 发明人 GODET LUDOVIC;LU XIANFENG;RENAU ANTHONY
分类号 H05H1/24;B05C11/00;C23C16/50 主分类号 H05H1/24
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