RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYPHENOL COMPOUND USED THEREIN, AND ALCOHOL COMPOUND CAPABLE OF BEING DERIVED THEREFROM

摘要

A resist composition containing a compound represented by general formula (1) or (2), a resist pattern formation method using said resist composition, a polyphenol compound used in the resist pattern formation method, and an alcohol compound capable of being derived from said polyphenol compound. (In general formula (1) and (2), each R1 independently represents a single bond or a C1-30 2n valent hydrocarbon group, wherein said hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom, or a C6-30 aromatic group; each R2 independently represents a hydrogen atom, a halogen atom, a C1-10 linear, branched or cyclic alkyl group, a C6-10 aryl group, a C2-10 alkenyl group, or a hydroxyl group, and may be the same or different from one another in the same naphthalene ring, at least one R2 being a hydroxyl group; n represents an integer between 1 and 4; and the structural formula of the repeating unit in formula (1) and (2) may be the same or different from one another. In general formula (1), each m1 independently represents an integer between 1 and 7. In general formula (2), each X independently represents an oxygen atom or a sulfur atom, and each m2 independently represents an integer between 1 and 6.)