发明名称 |
FILM DEPOSITION APPARATUS |
摘要 |
A film deposition apparatus includes a turntable including plural substrate placing areas in the circumferential direction; a gas nozzle provided to extend from an inner edge to an outer edge of the substrate placing area; a gas evacuation port provided outside of an outer edge of the turntable and downstream in a rotational direction of the turntable with respect to the gas nozzle for evacuating the gas; and a regulation member including a wall portion provided between the gas nozzle and the gas evacuation port for isolating the gas nozzle and the gas evacuation port at least at a part between the inner edge to the outer edge of the substrate placing area while having a space extending from the inner edge to the outer edge of the substrate placing area when a substrate is placed on the substrate placing area.
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申请公布号 |
US2013042813(A1) |
申请公布日期 |
2013.02.21 |
申请号 |
US201213571546 |
申请日期 |
2012.08.10 |
申请人 |
TOKYO ELECTRON LIMITED;KATO HITOSHI;USHIKUBO SHIGEHIRO;HISHIYA KATSUYUKI |
发明人 |
KATO HITOSHI;USHIKUBO SHIGEHIRO;HISHIYA KATSUYUKI |
分类号 |
C23C16/458 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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