METHOD FOR ETCHING COPPER/MOLYBDENUM ALLOY FILM WITH INCREASED ETCHING CAPACITY OF ETCHANT

摘要

The present invention relates to a method for increasing the etching capacity of a copper/molybdenum alloy film used in the manufacture of TFT-LCD. The method of the present invention can increase the etching capacity of an etchant by recovering the degradation of etching properties such as an etch rate, a taper profile, and etch linearity which are generated when etching is repeated using the etchant with the copper/molybdenum alloy film, thereby substantially reducing production costs for TFT-LCD, and the like.