CONTACTLESS MASK PATTERN EXPOSURE PROCESS AND APPARATUS SYSTEM HAVING VIRTUAL EXTENDED DEPTH OF FOCUS

摘要

Forming a photoresist mask pattern by employing a three-dimensional mask having non-reflective passages. The mask pattern is recorded on a holographic plate to form a holographic pattern. Thereafter, the holographic pattern is spatially reconstructed so as to form a reconstructed radiation mask pattern having a virtual extended depth of focus defined by the mask entrance and exit images which is used to expose a photo-sensitized surface.