A SUBSTRATE TABLE ASSEMBLY, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

摘要

PURPOSE: A substrate table assembly, an immersion lithographic apparatus and a method for manufacturing a device are provided to compensate for cooling due to immersion evaporation and to prevent the deformation of a substrate. CONSTITUTION: A substrate table(WT) supports a substrate(W). A gas processing system supplies gas to the substrate table and a region between substrate tables. The substrate table includes a gas supply port and a fluid extracting port. Two inlet ports are formed at both sides of a projection system(PS). The Two inlet ports supply liquid. Outlet ports are arranged outside the inlet ports to remove the liquid.