发明名称 Field effect transistor with conduction band electron channel and uni-terminal response
摘要 A uni-terminal transistor device is described. In one embodiment, an n-channel transistor comprises a first semiconductor layer having a discrete hole level H 0 ; a second semiconductor layer having a conduction band minimum E C2 ; a wide bandgap semiconductor barrier layer disposed between the first and the second semiconductor layers; a gate dielectric layer disposed above the first semiconductor layer; and a gate metal layer disposed above the gate dielectric layer and having an effective workfunction selected to position the discrete hole level H 0 below the conduction band minimum E c2 for zero bias applied to the gate metal layer and to obtain n-terminal characteristics.
申请公布号 EP2355158(A3) 申请公布日期 2013.02.20
申请号 EP20110000710 申请日期 2011.01.28
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 PASSLACK, MATTHIAS
分类号 H01L29/778;H01L29/201;H01L29/205;H01L29/43;H01L29/51 主分类号 H01L29/778
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