发明名称 GAS INJECTION UNIT AND A THIN-FILM VAPOUR-DEPOSITION DEVICE AND METHOD USING THE SAME
摘要 <p>Provided are a gas injection unit and apparatus and method for depositing a thin layer using the same. The gas injection unit includes: an inner pipe through which a reaction gas is introduced; an outer pipe enclosing the inner pipe, through which a cooling fluid cooling the reaction gas in the inner pipe flows; and injection pipes injecting the reaction gas in the inner pipe to an outside of the outer pipe.</p>
申请公布号 EP2560193(A1) 申请公布日期 2013.02.20
申请号 EP20100849896 申请日期 2010.09.06
申请人 SEMES CO., LTD. 发明人 PARK, HYEONG SOO
分类号 H01L21/205;C23C16/458 主分类号 H01L21/205
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