| 摘要 |
PURPOSE: A plasma processing apparatus capable of simultaneously executing a uniform plasma process on multiple articles to be processed and a processing system thereof are provided to perform impedance correction for each electrode pair using an impedance correction tool. CONSTITUTION: Each article to be processed of more than two lower electrodes(10a-10e) is loaded on a loading surface. Each of upper electrodes(11a-11e) forms an electrode pair with the lower electrodes. A ground line(13a-13e) is connected to one side of a facing surface facing the loading surface of each upper electrode and the central part of the opposite side surface. A high frequency supply line(14a-14e) is connected to a different side which is not connected to the ground line. A shield member(12a-12f) accommodates the ground line and the high frequency supply line inside a process chamber(31a). An impedance correction tool(15a-15e) is installed at each of the ground lines. [Reference numerals] (AA,BB) To an exhaust apparatus(9) |
