ETCHING SOLUTION APPLICATION DEVICE FOR OFFSET PRINTING MACHINES

摘要

An etching solution application device for use with offset printing machines of the type wherein master plates are fed automatically to the master cylinder and comprising an etching solution applying roller mounted for rotary motion and adapted to be brought into and out of pressing contact with the master cylinder in synchronism with the automatic mounting of the master plate on the master cylinder to apply the etching solution to the surface of the master plate. The etching solution application device is rendered inoperative and locked automatically as the applying roller is released from engagement with the master plate upon completion of the etching solution application operation.