| 摘要 |
<p>PURPOSE: A method for manufacturing a substrate with a nanopattern for a high efficiency nitride light emitting diode is provided to improve yield by simply forming a pattern in a large area. CONSTITUTION: A resist thin film is formed on one side of a substrate. An etch-resistant resist thin film is formed on one side of a nanomold. A substrate with a nanopattern is etched. The etched substrate is annealed. The nanopattern includes a bottom part and a convex part. [Reference numerals] (1,AA,CC,FF,II,KK,MM,1) Substrate for a light emitting diode; (2) Etch-resistant resist coating; (3) Nanoimprint lithography; (BB) Etch-resistant resist; (DD) Pressurization; (EE,GG) Flexible polymer duplication mold; (HH,JJ) Resist</p> |
