发明名称 Group III nitride single crystal and method of its growth
摘要 Affords methods of growing III nitride single crystals of favorable crystallinity with excellent reproducibility, and the III nitride crystals obtained by the growth methods. One method grows a III nitride single crystal (3) inside a crystal-growth vessel (11), the method being characterized in that a porous body formed from a metal carbide, whose porosity is between 0.1% and 70% is employed in at least a portion of the crystal-growth vessel (11). Employing the crystal-growth vessel (11) makes it possible to discharge from 1% to 50% of a source gas (4) inside the crystal-growth vessel (11) via the pores in the porous body to the outside of the crystal-growth vessel (11).
申请公布号 US8377204(B2) 申请公布日期 2013.02.19
申请号 US20060305001 申请日期 2006.06.16
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;MIYANAGA MICHIMASA;MIZUHARA NAHO;FUJIWARA SHINSUKE;NAKAHATA SEIJI;NAKAHATA HIDEAKI 发明人 MIYANAGA MICHIMASA;MIZUHARA NAHO;FUJIWARA SHINSUKE;NAKAHATA SEIJI;NAKAHATA HIDEAKI
分类号 C30B23/00;B32B5/16 主分类号 C30B23/00
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