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发明名称
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
申请公布号
KR101234684(B1)
申请公布日期
2013.02.19
申请号
KR20080060253
申请日期
2008.06.25
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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