发明名称 Semiconductor substrate structure and semiconductor device
摘要 A semiconductor substrate structure includes an electrode pad formed on a semiconductor substrate, a protective film formed on the semiconductor substrate with a distance from the electrode pad, and a bump formed on the electrode pad. The protective film has a barrier portion surrounding the electrode pad. The barrier portion has a height different from a height of a part of the protective film other than the barrier portion.
申请公布号 US8378505(B2) 申请公布日期 2013.02.19
申请号 US201113189097 申请日期 2011.07.22
申请人 PANASONIC CORPORATION;NAKANO SUMIAKI 发明人 NAKANO SUMIAKI
分类号 H01L23/492 主分类号 H01L23/492
代理机构 代理人
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