发明名称 MOS-gated power devices, methods, and integrated circuits
摘要 MOS-gated devices, related methods, and systems for vertical power and RF devices including an insulated trench and a gate electrode. A body region is positioned so that a voltage bias on the gate electrode will cause an inversion layer in the body region. Permanent electrostatic charges are included in said insulation material. A conductive shield layer is positioned above the insulated trench, to reduce parasitic capacitances.
申请公布号 US8378416(B2) 申请公布日期 2013.02.19
申请号 US20090626589 申请日期 2009.11.25
申请人 MAXPOWER SEMICONDUCTOR, INC.;DARWISH MOHAMED N.;ZENG JUN 发明人 DARWISH MOHAMED N.;ZENG JUN
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址