| 摘要 |
PURPOSE: An in-line exposure system using a virtual irradiation pattern and an exposure method using the same are provided to easily adjust the shape of exposure patterns in a two-dimensional form or a three-dimensional form by controlling line light source irradiated to a transferring target. CONSTITUTION: An in-line exposure system using a virtual irradiation pattern(100) includes a transferring part(110), a photo-sensitizer laminating part(120), an exposure part(130), and a printing part(140). The transferring part transfers a substrate to a pre-set direction. The photo-sensitizer laminating part laminates a photo-sensitizer to the substrate in order to prepare a target to be exposed. The exposure part exposes the target to be exposed by irradiating light. The printing part prints the exposed target. The exposure part includes a light irradiating part and a light controlling part. |
