发明名称 Semiconductor device with a controlled cavity and method of formation
摘要 A semiconductor device includes a first cap wafer having a first opening extending through the first cap wafer, and a second cap wafer bonded to the first cap wafer, wherein the second cap wafer has a second opening extending through the second cap wafer, and wherein the first opening is misaligned with respect to the second opening. The second cap wafer is bonded to a device wafer, wherein a cavity is formed between the device wafer and the second cap wafer, and wherein the device wafer comprises at least one semiconductor device in the cavity. A vacuum sealing layer is formed over the first cap wafer, wherein the sealing layer vacuum seals the first opening.
申请公布号 US8378433(B2) 申请公布日期 2013.02.19
申请号 US201113160137 申请日期 2011.06.14
申请人 FREESCALE SEMICONDUCTOR, INC.;HAYES SCOTT M.;DANIELS DWIGHT L. 发明人 HAYES SCOTT M.;DANIELS DWIGHT L.
分类号 H01L27/14;H01L23/02 主分类号 H01L27/14
代理机构 代理人
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