| 摘要 |
PURPOSE: An apparatus of processing a baffle and a substrate and a processing method thereof are provided to improve process uniformity in substrate processing by uniformly and stably forming the flow of plasma in all parts of a processing chamber. CONSTITUTION: A substrate processing apparatus(30) comprises a processing chamber(100) and a plasma generator(200). A substrate processing process is performed in the processing chamber. The plasma generator produces plasma used for processing a substrate. The plasma generator provides the plasma to the processing chamber in down stream method. The plasma generator is combined with the processing chamber. The plasma generator includes a reactor(210), a gas injection port(220), and a plasma source(230). |
