发明名称 |
Photoresist coating and developing apparatus, substrate transfer method and interface apparatus |
摘要 |
A photoresist coating and developing apparatus 1 includes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unit 61 that heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber L1 that unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer device 62 that transfers the substrate from the heating unit 61 to the load-lock chamber L1.
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申请公布号 |
US8376637(B2) |
申请公布日期 |
2013.02.19 |
申请号 |
US20100940101 |
申请日期 |
2010.11.05 |
申请人 |
TOKYO ELECTRON LIMITED;YAMADA YOSHIAKI;YAMAMOTO YUICHI;KOSUGI HITOSHI;FUJIMOTO SEIJI |
发明人 |
YAMADA YOSHIAKI;YAMAMOTO YUICHI;KOSUGI HITOSHI;FUJIMOTO SEIJI |
分类号 |
G03D5/00 |
主分类号 |
G03D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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