发明名称 |
APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES |
摘要 |
An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window.
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申请公布号 |
US2013040080(A1) |
申请公布日期 |
2013.02.14 |
申请号 |
US201213652814 |
申请日期 |
2012.10.16 |
申请人 |
BHANG KENNETH J.;DAVIS MATTHEW F.;MOREY TRAVIS;CARDUCCI JAMES D. |
发明人 |
BHANG KENNETH J.;DAVIS MATTHEW F.;MOREY TRAVIS;CARDUCCI JAMES D. |
分类号 |
B32B3/06 |
主分类号 |
B32B3/06 |
代理机构 |
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