发明名称 |
MAGNETIC MEMORY DEVICE AND FABRICATION METHOD THEREOF |
摘要 |
<p>PURPOSE: A magnetic memory device and a manufacturing method thereof are provided to improve a TMR(Tunnel Magneto Resistance) effect by forming a tunnel barrier using oxide between a free layer and a second pinned layer. CONSTITUTION: A first tunnel barrier is contacted with the surface of a first pinned layer(403). A free layer(407) is contacted with the surface of a first tunnel barrier. The free layer has a laminate structure of a first ferromagnetic layer, an oxide tunnel spacer, and a second ferromagnetic layer. A second tunnel barrier is contacted with the surface of the free layer. A second pinned layer(411) is contacted with the surface of the second tunnel barrier. [Reference numerals] (401) Seed layer; (403) First pinned layer; (405) First tunnel barrier; (407) Free layer; (409) Second tunnel barrier; (411) Second pinned layer; (413) Capping layer; (471) First ferromagnetic layer; (473) Tunnel spacer; (475) Second ferromagnetic layer</p> |
申请公布号 |
KR20130015928(A) |
申请公布日期 |
2013.02.14 |
申请号 |
KR20110078269 |
申请日期 |
2011.08.05 |
申请人 |
SK HYNIX INC. |
发明人 |
JUNG, DONG HA;PARK, KI SEON;KIM, GUK CHEON |
分类号 |
H01L27/115;H01L21/8247;H01L43/00 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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