INSPECTION DEVICE, LITHOGRAPHIC APPARATUS, LITHOGRAPHY PROCESSING CELL, AND INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a technique for accurately finding characteristics of a substrate while preventing diffraction order from being overlapped.

SOLUTION: A radiation beam having an illumination profile with four quadrants is used for angle resolution spectroscopy. The first and third quadrants are illuminated, meanwhile, the second and fourth quadrants are not illuminated. Therefore, a resultant pupil surface is divided into the four quadrants, only a zero-order diffraction pattern appears on the first and third quadrants, and only a first-order diffraction pattern appears on the second and third quadrants.

COPYRIGHT: (C)2013,JPO&INPIT