发明名称 |
CAPPING LAYERS FOR IMPROVED CRYSTALLIZATION |
摘要 |
Techniques for fabrication of kesterite Cu-Zn-Sn-(Se,S) films and improved photovoltaic devices based on these films are provided. In one aspect, a method of fabricating a kesterite film having a formula Cu2-xZn1+ySn(S1-zSez)4+q, wherein 0=x=1; 0=y=1; 0=z=1; and -1=q=1 is provided which includes the following steps. A substrate is provided. A bulk precursor layer is formed on the substrate comprising Cu, Zn, Sn and at least one of S and Se. A capping layer is formed on the bulk precursor layer comprising at least one of Sn, S and Se. The bulk precursor layer and the capping layer are annealed under conditions sufficient to produce the kesterite film having values of x, y, z and q for any given part of the film that deviate from average values of x, y, z and q throughout the film by less than 20 percent. |
申请公布号 |
WO2013022617(A1) |
申请公布日期 |
2013.02.14 |
申请号 |
WO2012US48586 |
申请日期 |
2012.07.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;BAG, SANTANU;BARKHOUSE, DAVID AARON RANDOLPH;MITZI, DAVID BRIAN;TODOROV, TEODOR KRASSIMIROV |
发明人 |
BAG, SANTANU;BARKHOUSE, DAVID AARON RANDOLPH;MITZI, DAVID BRIAN;TODOROV, TEODOR KRASSIMIROV |
分类号 |
H01L21/477 |
主分类号 |
H01L21/477 |
代理机构 |
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代理人 |
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地址 |
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