发明名称 METHOD FOR PRODUCING MOLD, AND COMPACT HAVING MINUTE IRREGULARITY STRUCTURE ON SURFACE THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide: a method for producing a mold, by which an oxide film formed at first can be reduced in thickness without using a special device even when a mold including pores having large spacing is produced, and hardly causing macro irregularities derived from crystal grain boundary on a transfer surface; and a compact having a minute irregularity structure on a surface thereof, to which a minute irregularity structure of the mold is transferred. <P>SOLUTION: The method for producing a mold 18 comprising an oxide film 14 which has a plurality of pores 12 and is formed on a surface of an aluminum base material 10 includes a step (a) of intermittently flowing current through the aluminum base material 10 in an electrolyte to perform anodic oxidation and forming, on the surface of an aluminum base material 10, the oxide film 14 having a plurality of pores 12. The compact has a minute irregularity structure on a surface thereof, to which a minute irregularity structure comprising the plurality of pores 12 formed on a surface of the mold 18 obtained by the method is transferred. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013032569(A) 申请公布日期 2013.02.14
申请号 JP20110169436 申请日期 2011.08.02
申请人 MITSUBISHI RAYON CO LTD;KANAGAWA ACAD OF SCI & TECHNOL 发明人 IGAWA MASASHI;OKAMOTO HIDEKO;MASUDA HIDEKI
分类号 C25D11/04;B29C33/38;C25D11/12 主分类号 C25D11/04
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