PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS
摘要
A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH-R' where Rf=CnF2n+1- and n=1 to 6, R'=-H, -CH3, and -CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.
申请公布号
WO2013022673(A2)
申请公布日期
2013.02.14
申请号
WO2012US49158
申请日期
2012.08.01
申请人
3M INNOVATIVE PROPERTIES COMPANY;KEHREN, JASON M.;SAVU, PATRICIA M.;PINNOW, MATTHEW J.
发明人
KEHREN, JASON M.;SAVU, PATRICIA M.;PINNOW, MATTHEW J.