发明名称 Detection of Wafer-Edge Defects
摘要 Apparatus for inspection of a disk, which includes a crystalline material and has first and second sides. The apparatus includes an X-ray source, which is configured to direct a beam of X-rays to impinge on an area of the first side of the disk. An X-ray detector is positioned to receive and form input images of the X-rays that are diffracted from the area of the first side of the disk in a reflective mode. A motion assembly is configured to rotate the disk relative to the X-ray source and detector so that the area scans over a circumferential path in proximity to an edge of the disk. A processor is configured to process the input images formed by the X-ray detector along the circumferential path so as to generate a composite output image indicative of defects along the edge of the disk.
申请公布号 US2013039471(A1) 申请公布日期 2013.02.14
申请号 US201213570271 申请日期 2012.08.09
申请人 JORDAN VALLEY SEMICONDUCTORS LTD.;WORMINGTON MATTHEW;RYAN PAUL;WALL JOHN LEONARD 发明人 WORMINGTON MATTHEW;RYAN PAUL;WALL JOHN LEONARD
分类号 G01N23/207 主分类号 G01N23/207
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