发明名称 |
Detection of Wafer-Edge Defects |
摘要 |
Apparatus for inspection of a disk, which includes a crystalline material and has first and second sides. The apparatus includes an X-ray source, which is configured to direct a beam of X-rays to impinge on an area of the first side of the disk. An X-ray detector is positioned to receive and form input images of the X-rays that are diffracted from the area of the first side of the disk in a reflective mode. A motion assembly is configured to rotate the disk relative to the X-ray source and detector so that the area scans over a circumferential path in proximity to an edge of the disk. A processor is configured to process the input images formed by the X-ray detector along the circumferential path so as to generate a composite output image indicative of defects along the edge of the disk.
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申请公布号 |
US2013039471(A1) |
申请公布日期 |
2013.02.14 |
申请号 |
US201213570271 |
申请日期 |
2012.08.09 |
申请人 |
JORDAN VALLEY SEMICONDUCTORS LTD.;WORMINGTON MATTHEW;RYAN PAUL;WALL JOHN LEONARD |
发明人 |
WORMINGTON MATTHEW;RYAN PAUL;WALL JOHN LEONARD |
分类号 |
G01N23/207 |
主分类号 |
G01N23/207 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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