发明名称 |
VAPOR PHASE GROWTH DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor phase growth device which prevents a heat decomposition product from adhering on a view port inner surface and enables optical monitor and measurement of a substrate to be reliably conducted from a view port. <P>SOLUTION: A vapor phase growth device heats a substrate 12 installed in a reactor 11 covered by a sealing plate 15 to a preset temperature and supplies a material gas to the reactor to form a thin film on a substrate surface. In the vapor growth device, a cylindrical member 21 is disposed between a view port 16 provided at the reactor exterior side of the sealing plate and a through hole 23 provided at the sealing plate and the interior of the cylindrical member is used as an optical path for passing measuring beam of an optical measuring apparatus 20 which monitors and measures the substrate surface. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013033842(A) |
申请公布日期 |
2013.02.14 |
申请号 |
JP20110168962 |
申请日期 |
2011.08.02 |
申请人 |
TAIYO NIPPON SANSO CORP;TAIYO NISSAN EMC KK |
发明人 |
UBUKATA EITOKU;TABUCHI TOSHIYA;MATSUMOTO ISAO |
分类号 |
H01L21/205;C23C16/44;H01L21/31 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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