| 摘要 |
<p>The present invention relates to a method of making a coated body comprising a coating and a substrate where onto said substrate a coating is deposited, using a PVD deposition process. The coating comprises a nitride, carbide, oxide, boride or mixtures thereof, of one or more elements of groups IVb, Vb, VIb, Al, Y and Si. The deposition process comprises at least one sequence of varying the substrate bias voltage, while maintaining the active targets, where the sequence of varying the substrate bias voltage comprises a subsequence S i ;
- depositing at a first substrate bias voltage, B i , for a deposition time, T i , of between 10 seconds and 60 minutes, then, during a ramping time, R i , of between 10 seconds and 40 minutes, while depositing, gradually changing the substrate bias voltage to a second substrate bias voltage B i+1 , where |B i -B i+1 |‰¥ 10 V,
the subsequence, S i , is repeated until i=n where i=0, 1, 2, .... n, and where each new subsequence starts the deposition at the same substrate bias voltage used when ending the previous subsequence.</p> |
