EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: A semiconductor manufacturing apparatus for an epitaxial process is provided to remove a natural oxide layer from a substrate or prevent the natural oxide layer from being formed on the substrate. CONSTITUTION: A front end module(3) is mounted in the front of a process apparatus(2) and transfers a wafer between a container with a substrate and the process apparatus. A cleaning chamber(108a,108b) provides a space for a cleaning process. An epitaxial chamber(112a,112b,112c) provides a space for forming an epitaxial layer on the substrate. A buffer chamber(110) includes a substrate loading space. A load lock chamber(106) is located on the side of a transfer chamber(102) near the front end module.