| 摘要 |
<p>An aqueous alkaline composition for treating the surface of silicon substrates, the said composition comprising:
(A) a quaternary ammonium hydroxide; and
(B) a component selected from the group consisting of water-soluble acids and their water-soluble salts of the general formulas (I) to (V):
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ (R 1 -SO 3 - ) n X n+ €ƒ€ƒ€ƒ€ƒ€ƒ(I),
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ R-PO 3 2- (X n+ ) 3-n €ƒ€ƒ€ƒ€ƒ€ƒ(II);
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ (RO-SO 3 - ) n X n+ €ƒ€ƒ€ƒ€ƒ€ƒ(III),
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ RO-PO 3 2- (X n+ ) 3-n €ƒ€ƒ€ƒ€ƒ€ƒ(IV),
and
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ [(RO) 2 PO 2 - ] n X n+ €ƒ€ƒ€ƒ€ƒ€ƒ(V);
wherein the n = 1 or 2; X is hydrogen, ammonium, or alkaline or alkaline-earth metal; the variable R 1 is an olefinically unsaturated aliphatic or cycloaliphatic moiety and R is R 1 or an alkylaryl moiety; and
(C) a buffer system, wherein at least one component other than water is volatile;
the use of the composition for treating silicon substrates, a method for treating the surface of silicon substrates, and methods for manufacturing devices generating electricity upon the exposure to electromagnetic radiation.</p> |
