| 摘要 |
PURPOSE: A chemical vapor deposition apparatus and method are provided to reduce time to be required to washing or organizing of a shower head by simply washing or organizing the shower head without disassembling a glove box. CONSTITUTION: A chamber(120) is installed inside a glove box(110). A globe(111) is installed at one sidewall(112) of the glove box. A lead(130) is combined to the upper end of the chamber. The lead is installed in order to open and close the chamber by a lead driving unit(140). The lead driving unit is supported by the globe box. A shower head is installed at one side of the chamber. The shower head supplies gas in the inner side of the camber. A susceptor supporting a substrate is arranged inside the chamber. |
