发明名称 Semiconductor device and method of manufacturing such a device
摘要 The invention relates to a semiconductor device (10) with a substrate (11) and a semiconductor body (1) comprising a bipolar transistor with in that order a collector region (2), a base region (3), and an emitter region (4), wherein the semiconductor body comprises a projecting mesa (5) comprising at least a portion of the collector region (2) and the base region (3), which mesa is surrounded by an isolation region (6). According to the invention, the semiconductor device (10) also comprises a field effect transistor with a source region, a drain region, an interposed channel region, a superimposed gate dielectric (7), and a gate region (8), which gate region (8) forms a highest part of the field effect transistor, and the height of the mesa (5) is greater than the height of the gate region (8). This device can be manufactured inexpensively and easily by a method according to the invention, and the bipolar transistor can have excellent high-frequency characteristics.
申请公布号 US8373236(B2) 申请公布日期 2013.02.12
申请号 US20070304506 申请日期 2007.06.12
申请人 NXP, B.V.;INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW;HIJZEN ERWIN;MELAI JOOST;VAN NOORT WIBO;DONKERS JOHANNES;MEUNIER-BEILLARD PHILIPPE;PIONTEK ANDREAS M.;CHOI LI JEN;VAN HUYLENBROECK STEFAAN 发明人 HIJZEN ERWIN;MELAI JOOST;VAN NOORT WIBO;DONKERS JOHANNES;MEUNIER-BEILLARD PHILIPPE;PIONTEK ANDREAS M.;CHOI LI JEN;VAN HUYLENBROECK STEFAAN
分类号 H01L27/06 主分类号 H01L27/06
代理机构 代理人
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