发明名称 |
Shower plate, method for manufacturing the shower plate, plasma processing apparatus using the shower plate, plasma processing method and electronic device manufacturing method |
摘要 |
Occurrence of a back-flow of plasma or ignition of gas for plasma excitation in a longitudinal hole portion can be prevented more completely, and a shower plate in which efficient plasma excitation is possible is provided. In shower plate 105, which is arranged in processing chamber 102 of a plasma processing apparatus and discharges gas for plasma excitation into processing chamber, porous-gas passing body 114 having a pore that communicates in the gas flow direction is fixed onto longitudinal hole 112 used as a discharging path of gas for plasma excitation. The pore diameter of a narrow path in a gas flowing path formed of a pore, which communicates to porous-gas passing body 114, is 10 μm or lower.
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申请公布号 |
US8372200(B2) |
申请公布日期 |
2013.02.12 |
申请号 |
US20070308333 |
申请日期 |
2007.06.13 |
申请人 |
TOKYO ELECTRON LTD.;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY;OKESAKU MASAHIRO;GOTO TETSUYA;OHMI TADAHIRO;ISHIBASHI KIYOTAKA |
发明人 |
OKESAKU MASAHIRO;GOTO TETSUYA;OHMI TADAHIRO;ISHIBASHI KIYOTAKA |
分类号 |
C23C16/455;C23C16/00;H01L21/3065 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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