| 摘要 |
An exposure apparatus having an element to be cooled and that exposes a substrate to patterned radiation by using the element. A reservoir houses a liquid coolant therein. A first pump, disposed between the reservoir and the element, supplies the coolant from the reservoir to the element. A heater, disposed between the first pump and the element, heats the coolant supplied from the first pump. A jacket receives the coolant from the heater and cools the element. A second pump, disposed between the jacket and the reservoir, reduces a pressure of the jacket and supplies the coolant from the jacket to reservoir. A cooler, disposed between the second pump and the reservoir, cools the coolant supplied from the second pump.
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