发明名称 Semiconductor device and production method thereof
摘要 An object of the present invention is to improve the quality control of a semiconductor device. By forming an inscription comprising a culled or pixel skipping pattern of dimples on the upper surface of a die pad in a QFN, it is possible to confirm the inscription by X-ray inspection or the like even after individuation and specify a cavity of a resin molding die. Further, it is possible to specify the position of a device region in a lead frame. As a result, when a defect appears, it is possible to sort a defective QFN by appearance inspection and improve quality control in the assembly of a QFN.
申请公布号 US8373258(B2) 申请公布日期 2013.02.12
申请号 US201113118401 申请日期 2011.05.28
申请人 RENESAS ELECTRONICS CORPORATION;MIZUSAKI SHINYA;FUKUHARA KAZUYA 发明人 MIZUSAKI SHINYA;FUKUHARA KAZUYA
分类号 H01L23/495;H01L21/44;H01L21/50;H01L21/56 主分类号 H01L23/495
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