发明名称 Lithographic apparatus and control system
摘要 A control system to control a position quantity of a movable object in dependency of signals provided by a sensor representing an actual position quantity of the moveable object, the control system being configured to provide a drive signal to an actuator which is able to apply forces to the moveable object, the control system including a set-point generator to provide a reference signal; a subtractor to provide an error signal, the error signal being the difference between the reference signal and the signals provided by the sensor; a control unit to provide a drive signal to the actuator in dependency of the error signal, wherein the control unit comprises a nonlinear controller to improve a low-frequency disturbance suppression, and wherein the control unit further includes a compensator to at least partially compensate the deterioration of the high-frequency behavior caused by the nonlinear controller.
申请公布号 US8373849(B2) 申请公布日期 2013.02.12
申请号 US20090580328 申请日期 2009.10.16
申请人 ASML NETHERLANDS B.V.;HEERTJES MARCEL FRANCOIS 发明人 HEERTJES MARCEL FRANCOIS
分类号 G03B27/58;G03B27/32;G03B27/42;G03B27/62 主分类号 G03B27/58
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