发明名称 |
Radiation source, lithographic apparatus and device manufacturing method |
摘要 |
A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
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申请公布号 |
US8373846(B2) |
申请公布日期 |
2013.02.12 |
申请号 |
US20090553368 |
申请日期 |
2009.09.03 |
申请人 |
ASML NETHERLANDS B.V.;LOOPSTRA ERIK ROELOF;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BANINE VADIM YEVGENYEVICH;JOSEPHINA MOORS JOHANNES HUBERTUS |
发明人 |
LOOPSTRA ERIK ROELOF;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BANINE VADIM YEVGENYEVICH;JOSEPHINA MOORS JOHANNES HUBERTUS |
分类号 |
G03B27/54;G03B27/42 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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