发明名称 SPINNING APPARATUS FOR TREATING SUBSTRATES
摘要 A spin processor of the invention is provided with: a rotary table which is arranged in an outer cup body and rotary-driven by a control motor in a state the substrate is held on the upper surface thereof; an inner cup body which is arranged in the outer cup body and driven vertically by a vertical drive mechanism between such a lowered position that the upper end of the inner cup body is lower than the upper surface of the rotary table and such an elevated position that the upper end thereof is higher than the substrate held on the rotary table; a first reflection plate which is arranged in the inner peripheral part of the outer cup body and used for reflecting the second treating liquid scattered from the peripheral part of the substrate downward when the substrate is rotated and treated with the second treating liquid in a state the inner cup body is kept in the lowered position; and a second reflection plate which is arranged in the inner peripheral part of the inner cup body and used for reflecting the first treating liquid scattered from the peripheral part of the substrate downward when the substrate is rotated and treated with the first treating liquid in a state the innercup body is kept in the elevated position.
申请公布号 KR101231749(B1) 申请公布日期 2013.02.08
申请号 KR20060064317 申请日期 2006.07.10
申请人 发明人
分类号 G02F1/13;H01L21/304 主分类号 G02F1/13
代理机构 代理人
主权项
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